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作者
作者:Huang, X (Huang, Xiang)[1,2,3 ]; Tian, RY (Tian, Ren-Yu)[1 ]; Yang, XB (Yang, Xiao-Bao)[1 ]; Zhao, YJ (Zhao, Yu-Jun)[1,2 ]
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文献类型:Article
摘要
The experimental observation that H2O molecules could be dissociated with a unity sticking coefficient on an Si(100)-2x1 surface in low temperatures (especially as low as 80 K) was not well understood because earlier theoretical attempts showed a relative high dissociation barrier. Herein, using density-functional theory calculations, we find that the additional H2O molecule tends to cluster with the preadsorbed one, with corresponding adsorption energy as high as 0.88 eV. In particular, the calculated barriers of two possible dissociation paths are lowered by nearly an order of magnitude, with the second H2O molecule acting as a catalyst. This leads to the feasibility of the H2O molecule dissociating at low temperatures.
关键词
KeyWords Plus:MOLECULAR-DYNAMICS; SILICON SURFACES; SI(001) SURFACE; WATER; PATHWAYS; TRIMETHYLAMINE; CHEMISORPTION; SI(100)C(4X2); ADSORPTION; ATTACHMENT
作者信息
通讯作者地址:Zhao, YJ (通讯作者)
![]() | S China Univ Technol, Dept Phys, Guangzhou 510640, Guangdong, Peoples R China. |
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电子邮件地址:zhaoyj@scut.edu.cn
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类别分类
研究方向:Chemistry; Science & Technology - Other Topics; Materials Science
Web of Science 类别:Chemistry, Physical; Nanoscience & Nanotechnology; Materials Science, Multidisciplinary