Title: Induim Tin Oxide (ITO) as a Diffusion Barrier Between Si and Cu

Speaker: Prof. Chen Wenzhao (National Yulin University of Science and Technology

Time: 3:00 pm, Wednesday, March 30, 2011

Place: Room 205, Bldg 14, SCUT North Campus

Sponser:School of Materials Science and Engineering

Brief introduction to Prof. Chen:
Prof.Chen, was born in Kaohsiung,Taiwan Province. He holds a Bachlor degreee from Feng Chia University and a PhD. from Tsinghua University. From 1998-1999 he visitedNational Laboratory in Lawrence USA as a guest professor and after that he has served in Taiwan Industrial Technology Research Institute, National Formosa University, National Pingtung University of Technology. Now he is a full professor in National Yulin University Of Science and Technology and the Dean of Humanities and Sciences. Up to now he has published over70 academic papers in refereed journals. Prof.Chen made extensive achievements in Silicide, diffusion barrier, electroless plating and so on.